The predominance of a surface plane of high work function on Ti films

dc.contributor.authorKandasamy, K.
dc.contributor.authorSurplice, N.A.
dc.date.accessioned2022-09-26T08:51:24Z
dc.date.available2022-09-26T08:51:24Z
dc.date.issued1981
dc.description.abstractThe contact potential between clean Ti films and an Au reference surface have been determined by the Kelvin vibrating capacitor method. The majority of Ti films deposited on glass substrates had a high work function, which suggests that their surface was mainly (0001). Ti films on substrates of oxidised Ti had a much lower work function and probably had a surface of mainly (1011).en_US
dc.identifier.issn00223719
dc.identifier.urihttp://repo.lib.jfn.ac.lk/ujrr/handle/123456789/8141
dc.language.isoenen_US
dc.publisherElsevier B.V.en_US
dc.titleThe predominance of a surface plane of high work function on Ti filmsen_US
dc.typeArticleen_US

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