Development and characterization of 𝐌n-doped 𝐂uS𝐂N hole transport material

dc.contributor.authorHathurusingha, K.
dc.date.accessioned2022-09-06T05:29:07Z
dc.date.available2022-09-06T05:29:07Z
dc.date.issued2022
dc.description.abstractPure and manganese (Mn)doped CuSCN thin-films were prepared by using dimethyl sulfoxide (DMSO) as the solvent via the doctor blade method, and their electrical, optical, and structural properties were characterized. Mn-doped CuSCN thin-films were prepared with Mn mass percentages as 2 %, 4 %, 6 %, 8 %, and 10 %. Structural and optical properties were characterized by using XRD and UV-Visible spectrometers. According to the sheet resistance value for the unit area of thin films, conductivity gradually increased with Mn concentration in samples up to the doping concentration of 6 % and this mass percentage of CuSCN sample exhibited the highest conductivity value. The calculated crystalline size for pure CuSCN is 70.7 nm and, 28.3 nm for the 10 % doped sample. It reveals that the crystalline size decreased with the increase of Mn concentration. All the Pure and Mn-doped CuSCN thin-films show the absorbance in the UV-Visible wavelength region of the spectrum. The calculated optical energy bandgap of CuSCN is 3.18 eV, and it exists within the semiconductor region and can be considered as a wide bandgap semiconductor. Hence, the Mn-doped CuSCN layer can be used as an efficient hole transport material (HTM) layer in dye-sensitized solar cells and other applications.en_US
dc.identifier.urihttp://repo.lib.jfn.ac.lk/ujrr/handle/123456789/6197
dc.language.isoenen_US
dc.publisherUniversity of Jaffnaen_US
dc.subjectCopper thiocyanateen_US
dc.subjectElectrical conductivityen_US
dc.subjectManganeseen_US
dc.subjectOptical bandgapen_US
dc.titleDevelopment and characterization of 𝐌n-doped 𝐂uS𝐂N hole transport materialen_US
dc.typeArticleen_US

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